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Overview

General comment

Tungsten CMP slurry for tungsten contact/via polish using alumina abrasive and ferric nitrate oxidizer.

Technology
Chemical production
Geography
Global
Terms used above
  • CMP chemical-mechanical polishing

System boundary

System boundary - Tungsten CMP SlurrySystem boundary figure: identity, gate in, entering flows, the dashed system boundary and the unit processes inside it, the reference product, emissions and waste, and below it the flows that are recorded but not quantified. No inventory quantities.Tungsten CMP SlurryGATE INRaw material inputsENTERING FLOWSElectricityWaterOtherSYSTEM BOUNDARYAGGREGATED PRODUCTION MODELModelled as one production operation.This dataset models the production of this material as a single aggregated operation at the supplier plant.Its inputs and outputs are recorded against that operation rather than a step-by-step recipe.REFERENCE PRODUCTTungsten CMP SlurryProduct at factory gateEMISSIONS AND WASTEEmissions to airEmissions to waterWaste routesRECORDED BUT NOT QUANTIFIEDIn scope, left out of the quantified inventoryCut off below the significance threshold, or with no background dataset available - each is listed with its reason1FLOWsystem boundaryreference flowentering flowemission / waste

The figure groups this dataset's unit processes by class. It is not a count of manufacturing steps — each process runs over as many passes as the flow requires, and those pass counts ship with the dataset.

Download this figure (SVG)

Data quality and references

Composite DQI 2.1 Good
Reliability
5.0
Completeness
1.0
Temporal
1.0
Geographic
2.0
Technological
4.0

Pedigree scores follow the ecoinvent data-quality matrix: 1 is the best attainable, 5 the weakest. The composite is their aggregate.

Sampling procedure
Slurry supplier product information, chemical-mechanical-planarization patents and handbook process chemistry, and chemical-blending literature for mixing energy. Commercial formulations are proprietary, so the composition is assembled component by component from published ranges, with each component linked to a mapped background market.
Coverage status
Partial
Pedigree-scored source files
Not stated
Dataset sources
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
  • Energy estimates from chemical blending literature

Technosphere inputs

6 flows. Quantities are not published; they ship with the dataset on Circa.

Aluminium oxide (Al2O3) Flowkg
Derivation basis
  • Quantity from the formulation/production-route recipe; upstream life cycle provenance is carried by the linked upstream unit process (see the technosphere reference)

No source is attached to this row.

Source citations
Not stated
Background data
ecoinvent 3.12
Background dataset
aluminium oxide, metallurgical
Notes
3.5% typical
Uncertainty
No range defined.
Unit
kg
Iron oxide (for ferric nitrate proxy) Flowkg
Derivation basis
  • Quantity from the formulation/production-route recipe; upstream life cycle provenance is carried by the linked upstream unit process (see the technosphere reference)

No source is attached to this row.

Source citations
Not stated
Background data
ecoinvent 3.12
Background dataset
iron(III) sulfate, without water, in 12.5% iron solution state
Notes
Proxy for ferric nitrate Fe(NO3)3 tungsten-CMP oxidizer; iron(III) sulfate is closest iron(III) salt in ecoinvent 3.12. "without water" = dry-salt mass basis.
Uncertainty
No range defined.
Unit
kg
Nitric acid Flowkg
Derivation basis
  • Quantity from the formulation/production-route recipe; upstream life cycle provenance is carried by the linked upstream unit process (see the technosphere reference)

No source is attached to this row.

Source citations
Not stated
Background data
ecoinvent 3.12
Background dataset
nitric acid, without water, in 50% solution state
Notes
For ferric nitrate proxy
Uncertainty
No range defined.
Unit
kg
Electricity, Global (GLO) ElectricitykWh · -33.3% / +66.7%
Derivation basis
  • Energy demand specified by the model.

No source is attached to this row.

Source citations
Not stated
Background data
ecoinvent 3.12
Background dataset
electricity, medium voltage
Notes
Mixing and filtration
Uncertainty
-33.3% / +66.7% around the published quantity. The bounds themselves ship with the dataset on Circa.
Unit
kWh
Ultrapure water Waterm3
Derivation basis
  • Quantity from the formulation/production-route recipe; upstream life cycle provenance is carried by the linked upstream unit process (see the technosphere reference)

No source is attached to this row.

Source citations
Not stated
Upstream REEL dataset
Ultrapure Water (UPW) Production
Background dataset
tap water
Notes
Balance of the formulation. This quantity is published on the referenced ultrapure-water dataset's own cubic-metre functional unit rather than as a mass, converted at the density of water, so a consumer resolving the reference scales it correctly. ROUTING: the referenced REEL ultrapure-water dataset is the authoritative background for this row - it carries the purification chain (pretreatment, reverse osmosis, ion exchange, polishing) that the slurry blender buys. The ecoinvent tap-water fields on this row are a FALLBACK disclosure only, for users who cannot resolve the REEL reference; tap water is not equivalent to ultrapure water and using it omits the whole purification chain. Do not book both.
Uncertainty
No range defined.
Unit
m3
Equipment cleaning water Waterm3
Derivation basis
  • Water demand specified by the model.

No source is attached to this row.

Source citations
Not stated
Background data
ecoinvent 3.12
Background dataset
tap water
Uncertainty
No range defined.
Unit
m3

Outputs and waste

Wastewater Wastewaterm3
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Background data
carried, no background dataset
Background dataset
No treatment route recorded for this output.
Notes
Equipment cleaning water
Uncertainty
No range defined.
Unit
m3
Filter media Solid wasteg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Background data
ecoinvent 3.12 treatment route
Background dataset
treatment of inert waste, sanitary landfill
Notes
From the filtration step. The filter media this waste comes from is not bought anywhere in this dataset: no public figure was found for how much media a batch of slurry consumes, so the discard is reported and the purchase behind it is left as a stated gap.
Uncertainty
No range defined.
Unit
g
Off-spec slurry Solid wasteg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Background data
ecoinvent 3.12 treatment route
Background dataset
treatment of inert waste, sanitary landfill
Uncertainty
No range defined.
Unit
g
Metal hydroxide sludge Solid wasteg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Background data
ecoinvent 3.12 treatment route
Background dataset
treatment of hazardous waste, underground deposit
Uncertainty
No range defined.
Unit
g

Emissions to air

1 elementary flow released to air by this dataset's own operations. Quantities are not published; they ship with the dataset on Circa.

Particulate matter Emission to airg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Compartment
Air (non-urban air or from high stacks)
ecoinvent 3.12 elementary flow
Particulate Matter, > 2.5 um and < 10um
Uncertainty
No range defined.
Unit
g

Emissions to water

3 elementary flows released to water by this dataset's own operations. Quantities are not published; they ship with the dataset on Circa.

Iron traces Emission to waterg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Compartment
Water (surface water)
Formula
Fe3+
ecoinvent 3.12 elementary flow
Iron ion
Uncertainty
No range defined.
Unit
g
Aluminium traces Emission to waterg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Compartment
Water (surface water)
Formula
Al3+
CAS number
22537-23-1
ecoinvent 3.12 elementary flow
Aluminium III
Uncertainty
No range defined.
Unit
g
Nitrate Emission to waterg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Compartment
Water (surface water)
Formula
NO3-
CAS number
14797-55-8
ecoinvent 3.12 elementary flow
Nitrate
Uncertainty
No range defined.
Unit
g

Flows not quantified

1 flow is recorded for this dataset but carries no quantity — cut off below the significance threshold, or with no background dataset available. It remains inside the declared system boundary; each is listed with its reason.

Not quantified - no background dataset available (1)

pH buffer (proxy: potassium iodate) Materialkg · ±66.7%
Derivation basis
  • The model specifies this input from the production route, either from the chemistry of the reaction or from the allowance the route sets for it. It also states the excess the route uses and the share it recovers for reuse.

The sources for this row are listed below.

Source citations (dataset-level)
  • CMP slurry literature and patents
  • Cabot Microelectronics product information
  • Semiconductor CMP handbook
Background data
no background dataset
Background dataset
Not applicable: this flow is not quantified in the inventory.
Notes
This buffer holds the slurry at its working pH. The recipe names a specialty chemical for it rather than a commodity salt, and no dataset in the mapped background answers to that salt.
Reason
No dataset in the mapped background answers to potassium iodate, the salt the recipe names for this buffer, and the stand-in offered beside it is a category of chemicals rather than a product anything can be linked to. The row ships with its quantity disclosed and no upstream link, and the production of the buffer salt stays outside the modelled boundary.
Uncertainty
±66.7% around the published quantity. The bounds themselves ship with the dataset on Circa.
Unit
kg

Limitations and unquantified flows (1)

Limits this dataset declares about itself: first any limit stated in its own description, then any limit it declares flow by flow, grouped by channel. Each entry below is the model's own disclosure.

From the dataset description

  • Component-based LCI; formulations are proprietary.

The flows above are this dataset's own records. What follows are the scope rules set once for the whole database in the methodology report, repeated here so every dataset page carries them.

Database-wide boundary policy — applies to every REEL dataset

These boundaries are set once for the whole database, in Chapter 2 of the methodology report, and apply to this dataset wherever they are relevant to it. The excluded flows listed above are specific to this dataset.

Use phase
Product operation is outside the cradle-to-gate scope.
End-of-life treatment
Recycling and disposal are outside the cradle-to-gate scope.
Distribution and retail
The gate is a finished component ready for integration into a higher-level assembly.
Inbound transport of raw materials
Transport of purchased raw materials to the manufacturing facility is already inside the upstream "market for" datasets that users link to a background database, so it is not modelled a second time here. This does not cover freight between REEL production stages, which is modelled where a dataset authors it.
Returnable shipping containers
Where freight between production stages is modelled, the mass moved is the product itself. The shipping container (FOSB, SEMI M31) is returnable capital equipment whose per-trip share is unsourced, so its tare is excluded from the transport effort.
Photomask fabrication
A mask set's embodied burden is amortised across a high-volume production run and is not attributed per wafer. Users assessing low-volume production should add mask fabrication separately; the methodology report gives the basis for the exclusion.
Employee transport, administration and R&D overhead
Employee transportation, facility administration and R&D/pilot-production overhead are outside scope.
Capital goods
Manufacturing equipment, cleanroom construction and facility infrastructure are excluded, on the grounds of absent public data on equipment embodied energy, uncertainty in equipment lifetime and allocation, common practice in electronics LCA, and a focus on the operational inventory. Future versions may include capital goods when sufficient public data becomes available.
Precious metal recovery credits
Scrap recovery credits for precious metals are excluded pending data availability.
Wafer reclaim
Test wafers and scrap are outside the system boundary.

Inside the boundary, linked rather than modelled

Silicon ingot growth and wafer slicing
Inside the cradle-to-gate scope, but treated as upstream material inputs linked to background databases rather than modelled as REEL processes.
Freight between production stages
Where a dataset's product moves between REEL production stages - wafer fabrication to the packaging site, for example - that leg is authored as a transport service and linked to an ecoinvent freight activity. It is measured as a transport effort in tonne-kilometres, not as a mass. Route distances are authored per route class with a stated band; a lower bound of zero is a modelling statement that the two sites can be co-located, not a missing value.

Cut-off criteria

A flow is excluded from a process inventory when it contributes less than 1 % of the total mass of inputs to that unit process, or less than 1 % of its total energy input. The denominator is total process inputs, not product mass. That distinction matters in semiconductor manufacturing, where the input mass of water, chemicals and gases greatly exceeds the product mass, so the threshold removes only genuinely minor flows.

Included regardless of the cut-off

  • Perfluorocarbons (CF4, C2F6, SF6, NF3) - high GWP, EPA regulated
  • Heavy metals (Pb, Cd, Hg, Cr(VI)) - RoHS regulated, high toxicity
  • Volatile organics (photoresist solvents, PGMEA) - air quality
  • Precious metals (Au, Ag, Pd, Pt) - high embodied impacts
  • Ozone-depleting substances (legacy CFCs, HCFCs) - Montreal Protocol