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Overview

General comment

Production of ultrapure water (UPW) for semiconductor manufacturing: pre-treatment, reverse osmosis, electrodeionization, UV treatment, and polishing to 18.2 MOhm-cm resistivity and <5 ppb TOC, for wet cleaning, CMP, lithography immersion, and rinse steps. This product includes municipal feed water, reverse-osmosis reject and the plant-boundary generation electricity, taken from the treatment-stage build-up for pre-treatment and intake pumping, primary reverse osmosis, polishing, and distribution. It reports the spent membrane modules and the spent ion exchange resin that leave the plant, but it does not buy them: neither consumable is bought anywhere in this dataset, because no public figure was found for how much membrane or resin a cubic metre of water consumes, so the two purchases behind those discards are left as a stated gap. It excludes heating for hot ultrapure water and general facility utilities. It is intended for purchasers or ingredient users of ultrapure water outside a fabrication model. REEL's fabrication models do not link this product. They carry municipal water separately and charge a facility-attributed blended rate, which includes hot ultrapure water and facility energy attribution. These boundaries are deliberately different; because fabrication datasets do not link this product, the two charges are never combined and there is no double counting.

Technology
Chemical production
Geography
Global
Terms used above
  • CMP chemical-mechanical polishing

System boundary

System boundary - Ultrapure Water (UPW) ProductionSystem boundary figure: identity, gate in, entering flows, the dashed system boundary and the unit processes inside it, the reference product, emissions and waste, and below it the flows that are recorded but not quantified. No inventory quantities.Ultrapure Water (UPW) ProductionGATE INNot stated in the dataset recordENTERING FLOWSElectricityOtherSYSTEM BOUNDARYMODELLED PROCESS SEQUENCEProcess sequencePretreatmentPrimary purificationPolishingDistributionREFERENCE PRODUCTUltrapure Water (UPW)Not stated in the dataset recordEMISSIONS AND WASTEEmissions to airEmissions to waterWaste routesRECORDED BUT NOT QUANTIFIEDExclusions not yet characterisedNo exclusion record was found for this datasetNOT CHARACTERISEDsystem boundaryreference flowentering flowemission / waste

The figure groups this dataset's unit processes by class. It is not a count of manufacturing steps — each process runs over as many passes as the flow requires, and those pass counts ship with the dataset.

Download this figure (SVG)

Data quality and references

Composite DQI 1.6 Very good
Reliability
2.0
Completeness
3.0
Temporal
1.0
Geographic
2.0
Technological
1.0

Pedigree scores follow the ecoinvent data-quality matrix: 1 is the best attainable, 5 the weakest. The composite is their aggregate.

Sampling procedure
SEMI guides and industry roadmap targets for water quality, water-treatment equipment vendor specifications, peer-reviewed cleanroom water research, trade-press coverage of polishing water use, a semiconductor manufacturer sustainability report, a public water-utility publication, and semiconductor trade press for plant configuration and treatment-stage electricity
Coverage status
Sparse
Pedigree-scored source files
Not stated
Dataset sources
  • Shih-Cheng Hu, Jen-Syua Wu, David Yih-Liang Chan, Rich Tsung-Chi Hsu, Jane Car-Cheng Lee, "Power consumption benchmark for a semiconductor cleanroom facility system", Energy and Buildings 40(9), 1765-1770, 2008
  • Evoqua Ionpure spec
  • SEMI, SEMI S23-1021E2: Guide for Conservation of Energy, Utilities and Materials Used by Semiconductor Manufacturing Equipment, SEMI Standards, April 2023
  • 2023 IRDS ESHS-ESSF
  • TSMC, 2024 Sustainability Report, TSMC Environmental Social and Governance (ESG) website, 2024
  • SemiconductorX, Ultrapure Water (UPW) for Semiconductor Fabs (undated), semiconductorx.com
  • G. Corlett, Targeting water use for chemical mechanical polishing, Solid State Technology, 2000, vol. 43, no. 6, pp. 201-202
  • PUB (Singapore National Water Agency), Singapore's Industrial Water Revolution, PUB Featured Stories, 2025
  • Semi Engineering staff, How Semiconductor Fabs Use Water, Semiconductor Engineering (semiengineering.com), August 2025
  • SEMI, SEMI F63-1224: Guide for Ultrapure Water Used in Semiconductor Processing, SEMI Standards, December 2024
  • ITRS roadmap UPW quality targets (edition not identified in extraction)
  • MKS Instruments and Purite (Veolia) UPW quality specifications
  • Purite (Veolia Water Purification Systems Ltd), UPW (UltraPure Water) for semiconductor manufacturing, purite.com, January 2024

Technosphere inputs

2 flows. Quantities are not published; they ship with the dataset on Circa.

Municipal water Flowm3 · ±6.7%
Derivation basis
  • Quantity from the formulation/production-route recipe; upstream life cycle provenance is carried by the linked upstream unit process (see the technosphere reference)

No source is attached to this row.

Source citations
Not stated
Background data
ecoinvent 3.12
Background dataset
tap water
Notes
Feed water for the RO system; the input-to-output ratio reflects reverse-osmosis recovery
Uncertainty
±6.7% around the published quantity. The bounds themselves ship with the dataset on Circa.
Unit
m3
Electricity, Global (GLO) ElectricitykWh · ±34.4%
Derivation basis
  • Energy demand specified by the model.

No source is attached to this row.

Source citations
Not stated
Background data
ecoinvent 3.12
Background dataset
electricity, medium voltage
Notes
Cold UPW production + in-fab distribution (pretreatment, primary reverse osmosis, polishing, distribution pumping); hot-UPW heating excluded
Uncertainty
±34.4% around the published quantity. The bounds themselves ship with the dataset on Circa.
Unit
kWh

Outputs and waste

Wastewater WastewaterL
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
Background data
carried, no background dataset
Background dataset
No treatment route recorded for this output.
Notes
RO reject (high TDS) - sent to reclaim or discharge
Uncertainty
No range defined.
Unit
L
Spent membrane modules Solid wasteg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.
  • The fate stated on this row is landfill and the discard is a polymer membrane module, so what is modelled is the sanitary landfill of mixed plastic. That activity states both halves of the row: its reference material is waste plastic, and its operation is a sanitary landfill cell. The inert-waste route would price a polymer as mineral fill, and the plastics incineration route would charge the carbon of a combustion this row does not describe.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
Background data
ecoinvent 3.12 treatment route
Background dataset
Landfill
Notes
Amortized per m3 (membrane life ~3 years)
Uncertainty
No range defined.
Unit
g
Spent ion exchange resin Solid wasteg
Derivation basis
  • The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.
  • The fate stated on this row is regeneration or landfill, and the landfill branch is what is modelled; no credit is taken for the regeneration branch. The discard is a polystyrene ion exchange resin, so what is modelled is the sanitary landfill of mixed plastic. That activity states both halves of the row: its reference material is waste plastic, and its operation is a sanitary landfill cell. The inert-waste route would price a polymer as mineral fill, and the plastics incineration route would charge the carbon of a combustion this row does not describe.

The sources below are this dataset's own bibliography. They are not tied to this row.

Source citations (dataset-level)
Inherited from this dataset's own bibliography, not tied to this row:
Background data
ecoinvent 3.12 treatment route
Background dataset
Regeneration or landfill
Notes
Amortized per m3
Uncertainty
No range defined.
Unit
g

Emissions to air

No emissions to air are recorded at this level.

Emissions to water

No emissions to water are recorded at this level.

Flows not quantified

No flows are recorded for this dataset without a quantity.

The flows above are this dataset's own records. What follows are the scope rules set once for the whole database in the methodology report, repeated here so every dataset page carries them.

Database-wide boundary policy — applies to every REEL dataset

These boundaries are set once for the whole database, in Chapter 2 of the methodology report, and apply to this dataset wherever they are relevant to it. The excluded flows listed above are specific to this dataset.

Use phase
Product operation is outside the cradle-to-gate scope.
End-of-life treatment
Recycling and disposal are outside the cradle-to-gate scope.
Distribution and retail
The gate is a finished component ready for integration into a higher-level assembly.
Inbound transport of raw materials
Transport of purchased raw materials to the manufacturing facility is already inside the upstream "market for" datasets that users link to a background database, so it is not modelled a second time here. This does not cover freight between REEL production stages, which is modelled where a dataset authors it.
Returnable shipping containers
Where freight between production stages is modelled, the mass moved is the product itself. The shipping container (FOSB, SEMI M31) is returnable capital equipment whose per-trip share is unsourced, so its tare is excluded from the transport effort.
Photomask fabrication
A mask set's embodied burden is amortised across a high-volume production run and is not attributed per wafer. Users assessing low-volume production should add mask fabrication separately; the methodology report gives the basis for the exclusion.
Employee transport, administration and R&D overhead
Employee transportation, facility administration and R&D/pilot-production overhead are outside scope.
Capital goods
Manufacturing equipment, cleanroom construction and facility infrastructure are excluded, on the grounds of absent public data on equipment embodied energy, uncertainty in equipment lifetime and allocation, common practice in electronics LCA, and a focus on the operational inventory. Future versions may include capital goods when sufficient public data becomes available.
Precious metal recovery credits
Scrap recovery credits for precious metals are excluded pending data availability.
Wafer reclaim
Test wafers and scrap are outside the system boundary.

Inside the boundary, linked rather than modelled

Silicon ingot growth and wafer slicing
Inside the cradle-to-gate scope, but treated as upstream material inputs linked to background databases rather than modelled as REEL processes.
Freight between production stages
Where a dataset's product moves between REEL production stages - wafer fabrication to the packaging site, for example - that leg is authored as a transport service and linked to an ecoinvent freight activity. It is measured as a transport effort in tonne-kilometres, not as a mass. Route distances are authored per route class with a stated band; a lower bound of zero is a modelling statement that the two sites can be co-located, not a missing value.

Cut-off criteria

A flow is excluded from a process inventory when it contributes less than 1 % of the total mass of inputs to that unit process, or less than 1 % of its total energy input. The denominator is total process inputs, not product mass. That distinction matters in semiconductor manufacturing, where the input mass of water, chemicals and gases greatly exceeds the product mass, so the threshold removes only genuinely minor flows.

Included regardless of the cut-off

  • Perfluorocarbons (CF4, C2F6, SF6, NF3) - high GWP, EPA regulated
  • Heavy metals (Pb, Cd, Hg, Cr(VI)) - RoHS regulated, high toxicity
  • Volatile organics (photoresist solvents, PGMEA) - air quality
  • Precious metals (Au, Ag, Pd, Pt) - high embodied impacts
  • Ozone-depleting substances (legacy CFCs, HCFCs) - Montreal Protocol