Overview
- Technology
- Chemical production
- Geography
- Global
Terms used above
- CMP chemical-mechanical polishing
- STI shallow trench isolation
- ILD inter-layer dielectric
System boundary
The figure groups this dataset's unit processes by class. It is not a count of manufacturing steps — each process runs over as many passes as the flow requires, and those pass counts ship with the dataset.
Data quality and references
Pedigree scores follow the ecoinvent data-quality matrix: 1 is the best attainable, 5 the weakest. The composite is their aggregate.
- Sampling procedure
- Slurry supplier product information, planarization-conference presentations, chemical-mechanical-planarization patents and handbook process chemistry, and chemical-blending literature for mixing energy. Commercial formulations are proprietary, so the composition is assembled component by component from published ranges, with each component linked to a mapped background market.
- Coverage status
- Partial
- Pedigree-scored source files
- Not stated
- Dataset sources
-
- ICPT22 Session G3 Muskan
- CMP slurry literature and patents
- Cabot Microelectronics product information
- Semiconductor CMP handbook
- Energy estimates from chemical blending literature
Technosphere inputs
5 flows. Quantities are not published; they ship with the dataset on Circa.
Cerium oxide (CeO2) Flowkg
- Derivation basis
-
- Quantity from the formulation/production-route recipe; upstream life cycle provenance is carried by the linked upstream unit process (see the technosphere reference)
No source is attached to this row.
- Source citations
- Not stated
- Background data
- ecoinvent 3.12
- Background dataset
- cerium oxide
- Notes
- 2% typical; varies by application
- Uncertainty
- No range defined.
- Unit
- kg
Potassium hydroxide Flowkg
- Derivation basis
-
- Quantity from the formulation/production-route recipe; upstream life cycle provenance is carried by the linked upstream unit process (see the technosphere reference)
No source is attached to this row.
- Source citations
- Not stated
- Background data
- ecoinvent 3.12
- Background dataset
- potassium hydroxide
- Notes
- pH adjuster; 0.5% typical
- Uncertainty
- No range defined.
- Unit
- kg
Electricity, Global (GLO) ElectricitykWh · -33.3% / +66.7%
- Derivation basis
-
- Energy demand specified by the model.
No source is attached to this row.
- Source citations
- Not stated
- Background data
- ecoinvent 3.12
- Background dataset
- electricity, medium voltage
- Notes
- Mixing and filtration
- Uncertainty
- -33.3% / +66.7% around the published quantity. The bounds themselves ship with the dataset on Circa.
- Unit
- kWh
Ultrapure water Waterm3
- Derivation basis
-
- Quantity from the formulation/production-route recipe; upstream life cycle provenance is carried by the linked upstream unit process (see the technosphere reference)
No source is attached to this row.
- Source citations
- Not stated
- Upstream REEL dataset
- Ultrapure Water (UPW) Production
- Background dataset
- tap water
- Notes
- Balance of the formulation. This quantity is published on the referenced ultrapure-water dataset's own cubic-metre functional unit rather than as a mass, converted at the density of water, so a consumer resolving the reference scales it correctly. ROUTING: the referenced REEL ultrapure-water dataset is the authoritative background for this row - it carries the purification chain (pretreatment, reverse osmosis, ion exchange, polishing) that the slurry blender buys. The ecoinvent tap-water fields on this row are a FALLBACK disclosure only, for users who cannot resolve the REEL reference; tap water is not equivalent to ultrapure water and using it omits the whole purification chain. Do not book both.
- Uncertainty
- No range defined.
- Unit
- m3
Equipment cleaning water Waterm3
- Derivation basis
-
- Water demand specified by the model.
No source is attached to this row.
- Source citations
- Not stated
- Background data
- ecoinvent 3.12
- Background dataset
- tap water
- Uncertainty
- No range defined.
- Unit
- m3
Outputs and waste
Wastewater Wastewaterm3
- Derivation basis
-
- The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.
The sources below are this dataset's own bibliography. They are not tied to this row.
- Source citations (dataset-level)
- Inherited from this dataset's own bibliography, not tied to this row:
- CMP slurry literature and patents
- Cabot Microelectronics product information
- Semiconductor CMP handbook
- Background data
- carried, no background dataset
- Background dataset
- No treatment route recorded for this output.
- Notes
- Equipment cleaning water
- Uncertainty
- No range defined.
- Unit
- m3
Filter media Solid wasteg
- Derivation basis
-
- The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.
The sources below are this dataset's own bibliography. They are not tied to this row.
- Source citations (dataset-level)
- Inherited from this dataset's own bibliography, not tied to this row:
- CMP slurry literature and patents
- Cabot Microelectronics product information
- Semiconductor CMP handbook
- Background data
- ecoinvent 3.12 treatment route
- Background dataset
- treatment of inert waste, sanitary landfill
- Notes
- From the filtration step. The filter media this waste comes from is not bought anywhere in this dataset: no public figure was found for how much media a batch of slurry consumes, so the discard is reported and the purchase behind it is left as a stated gap.
- Uncertainty
- No range defined.
- Unit
- g
Off-spec slurry Solid wasteg
- Derivation basis
-
- The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.
The sources below are this dataset's own bibliography. They are not tied to this row.
- Source citations (dataset-level)
- Inherited from this dataset's own bibliography, not tied to this row:
- CMP slurry literature and patents
- Cabot Microelectronics product information
- Semiconductor CMP handbook
- Background data
- ecoinvent 3.12 treatment route
- Background dataset
- treatment of inert waste, sanitary landfill
- Uncertainty
- No range defined.
- Unit
- g
Emissions to air
1 elementary flow released to air by this dataset's own operations. Quantities are not published; they ship with the dataset on Circa.
Particulate matter Emission to airg
- Derivation basis
-
- The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.
The sources below are this dataset's own bibliography. They are not tied to this row.
- Source citations (dataset-level)
- Inherited from this dataset's own bibliography, not tied to this row:
- CMP slurry literature and patents
- Cabot Microelectronics product information
- Semiconductor CMP handbook
- Compartment
- Air (non-urban air or from high stacks)
- ecoinvent 3.12 elementary flow
- Particulate Matter, > 2.5 um and < 10um
- Notes
- Minor dust from powder handling
- Uncertainty
- No range defined.
- Unit
- g
Emissions to water
1 elementary flow released to water by this dataset's own operations. Quantities are not published; they ship with the dataset on Circa.
Cerium traces Emission to waterg
- Derivation basis
-
- The model estimates this flow from the mass balance of the operation and from the share of material the operation loses.
- No corresponding ecoinvent dataset or flow was identified for this entry, so it is published with its own quantity and no background link
The sources below are this dataset's own bibliography. They are not tied to this row.
- Source citations (dataset-level)
- Inherited from this dataset's own bibliography, not tied to this row:
- CMP slurry literature and patents
- Cabot Microelectronics product information
- Semiconductor CMP handbook
- Compartment
- Water (surface water)
- Formula
- Ce
- CAS number
- 7440-45-1
- ecoinvent 3.12 elementary flow
- Not stated
- Uncertainty
- No range defined.
- Unit
- g
Flows not quantified
3 flows are recorded for this dataset but carry no quantity — cut off below the significance threshold, or with no background dataset available. They remain inside the declared system boundary; each is listed with its reason.
Not quantified - no background dataset available (3)
Surfactant (proxy: polyethylene glycol) Materialkg · ±66.7%
- Derivation basis
-
- The model specifies this input from the production route, either from the chemistry of the reaction or from the allowance the route sets for it. It also states the excess the route uses and the share it recovers for reuse.
The sources for this row are listed below.
- Source citations (dataset-level)
-
- CMP slurry literature and patents
- Cabot Microelectronics product information
- Semiconductor CMP handbook
- Background data
- no background dataset
- Background dataset
- Not applicable: this flow is not quantified in the inventory.
- Notes
- Particle dispersion; 0.3% typical (silica slurries)
- Reason
- The recipe names polyethylene glycol as the stand-in for a proprietary dispersant, but no dataset in the mapped background answers to it. The row therefore ships with its quantity disclosed and no upstream link, and the production of the dispersant stays outside the modelled boundary.
- Uncertainty
- ±66.7% around the published quantity. The bounds themselves ship with the dataset on Circa.
- Unit
- kg
Polyacrylic acid (PAA – ceria STI dispersant) Materialkg · -80% / +100%
- Derivation basis
-
- The model specifies this input from the production route, either from the chemistry of the reaction or from the allowance the route sets for it. It also states the excess the route uses and the share it recovers for reuse.
The sources for this row are listed below.
- Source citations
-
- nccavs-usergroups.avs.org (2023). ICPT22 Session G3 Muskan. PDF document.
- Background data
- no background dataset
- Background dataset
- Not applicable: this flow is not quantified in the inventory.
- Notes
- Declared estimate, not a value read off the cited work. That study identifies this dispersant and the mechanism by which it stops the polish at the nitride, but every loading it works at is heavier than the dose booked here; only the upper end of this row's band reaches the lightest loading it reports. Used in ceria formulations for shallow trench isolation, not in silica formulations for interlayer and pre-metal dielectric.
- Reason
- No dataset in the mapped background answers to polyacrylic acid, and no near neighbour stands in for it: what this polymer does here depends on its own chain chemistry. The row ships with its quantity disclosed and no upstream link, and the production of the dispersant stays outside the modelled boundary.
- Uncertainty
- -80% / +100% around the published quantity. The bounds themselves ship with the dataset on Circa.
- Unit
- kg
PVP-K30 (polyvinylpyrrolidone – ceria STI dispersant) Materialkg · -80% / +100%
- Derivation basis
-
- The model specifies this input from the production route, either from the chemistry of the reaction or from the allowance the route sets for it. It also states the excess the route uses and the share it recovers for reuse.
The sources for this row are listed below.
- Source citations (dataset-level)
-
- CMP slurry literature and patents
- Cabot Microelectronics product information
- Semiconductor CMP handbook
- Background data
- no background dataset
- Background dataset
- Not applicable: this flow is not quantified in the inventory.
- Notes
- Declared estimate, and the least supported row in this recipe. The slurry literature this formulation was assembled from names this co-surfactant and the pairing it forms with the acid dispersant beside it, but the reference given for that could not be retrieved, so nothing retrievable stands behind it and no retrievable source reports a loading for it at all. The dose booked here is keyed to the acid dispersant beside it; it is an assumption, not a reported figure. Used in ceria formulations for shallow trench isolation.
- Reason
- No dataset in the mapped background answers to polyvinylpyrrolidone, and none of the bulk polymers that are available shares its synthesis route closely enough to stand in for it. The row ships with its quantity disclosed and no upstream link, and the production of the co-surfactant stays outside the modelled boundary.
- Uncertainty
- -80% / +100% around the published quantity. The bounds themselves ship with the dataset on Circa.
- Unit
- kg
Limitations and unquantified flows (1)
Limits this dataset declares about itself: first any limit stated in its own description, then any limit it declares flow by flow, grouped by channel. Each entry below is the model's own disclosure.
From the dataset description
- Component-based LCI; formulations are proprietary.
The flows above are this dataset's own records. What follows are the scope rules set once for the whole database in the methodology report, repeated here so every dataset page carries them.
Database-wide boundary policy — applies to every REEL dataset
These boundaries are set once for the whole database, in Chapter 2 of the methodology report, and apply to this dataset wherever they are relevant to it. The excluded flows listed above are specific to this dataset.
- Use phase
- Product operation is outside the cradle-to-gate scope.
- End-of-life treatment
- Recycling and disposal are outside the cradle-to-gate scope.
- Distribution and retail
- The gate is a finished component ready for integration into a higher-level assembly.
- Inbound transport of raw materials
- Transport of purchased raw materials to the manufacturing facility is already inside the upstream "market for" datasets that users link to a background database, so it is not modelled a second time here. This does not cover freight between REEL production stages, which is modelled where a dataset authors it.
- Returnable shipping containers
- Where freight between production stages is modelled, the mass moved is the product itself. The shipping container (FOSB, SEMI M31) is returnable capital equipment whose per-trip share is unsourced, so its tare is excluded from the transport effort.
- Photomask fabrication
- A mask set's embodied burden is amortised across a high-volume production run and is not attributed per wafer. Users assessing low-volume production should add mask fabrication separately; the methodology report gives the basis for the exclusion.
- Employee transport, administration and R&D overhead
- Employee transportation, facility administration and R&D/pilot-production overhead are outside scope.
- Capital goods
- Manufacturing equipment, cleanroom construction and facility infrastructure are excluded, on the grounds of absent public data on equipment embodied energy, uncertainty in equipment lifetime and allocation, common practice in electronics LCA, and a focus on the operational inventory. Future versions may include capital goods when sufficient public data becomes available.
- Precious metal recovery credits
- Scrap recovery credits for precious metals are excluded pending data availability.
- Wafer reclaim
- Test wafers and scrap are outside the system boundary.
Inside the boundary, linked rather than modelled
- Silicon ingot growth and wafer slicing
- Inside the cradle-to-gate scope, but treated as upstream material inputs linked to background databases rather than modelled as REEL processes.
- Freight between production stages
- Where a dataset's product moves between REEL production stages - wafer fabrication to the packaging site, for example - that leg is authored as a transport service and linked to an ecoinvent freight activity. It is measured as a transport effort in tonne-kilometres, not as a mass. Route distances are authored per route class with a stated band; a lower bound of zero is a modelling statement that the two sites can be co-located, not a missing value.
Cut-off criteria
A flow is excluded from a process inventory when it contributes less than 1 % of the total mass of inputs to that unit process, or less than 1 % of its total energy input. The denominator is total process inputs, not product mass. That distinction matters in semiconductor manufacturing, where the input mass of water, chemicals and gases greatly exceeds the product mass, so the threshold removes only genuinely minor flows.
Included regardless of the cut-off
- Perfluorocarbons (CF4, C2F6, SF6, NF3) - high GWP, EPA regulated
- Heavy metals (Pb, Cd, Hg, Cr(VI)) - RoHS regulated, high toxicity
- Volatile organics (photoresist solvents, PGMEA) - air quality
- Precious metals (Au, Ag, Pd, Pt) - high embodied impacts
- Ozone-depleting substances (legacy CFCs, HCFCs) - Montreal Protocol
Oxide CMP slurry for STI polish and ILD planarization using cerium oxide abrasive.